Electro-optic thin films by magnetron sputtering

Research output: Contribution to journalArticlepeer-review

Abstract

We provide a progress report of a continuing collaboration between the Kurt J. Lesker Company, and Carnegie Mellon University. We are developing and transferring an important manufacturing technology from an academic to an industrial environment and are using magnetron sputtering as a reliable technique for the deposition of epitaxial, high-quality electro-optics layers and light-emitting devices. Results are presented for LiNbO3 and Si3N4.

Original languageEnglish
Pages (from-to)1209-1219
Number of pages11
JournalNuovo Cimento della Societa Italiana di Fisica D - Condensed Matter, Atomic, Molecular and Chemical Physics, Biophysics
Volume20
Issue number7
DOIs
StatePublished - 1998
Externally publishedYes

ASJC Scopus Subject Areas

  • General Physics and Astronomy

Disciplines

  • Business

Fingerprint

Dive into the research topics of 'Electro-optic thin films by magnetron sputtering'. Together they form a unique fingerprint.

Cite this