Erbium-doped glass ridge waveguides fabricated with a collimated magnetron sputter deposition process

Cheng Chung Li; Hong Koo Kim; Michele Migliuolo

doi:10.1117/12.264241

Erbium-doped glass ridge waveguides fabricated with a collimated magnetron sputter deposition process

Cheng Chung Li
, Hong Koo Kim
, Michele Migliuolo

Research output: Contribution to journal › Conference article › peer-review

Abstract

We report a new fabrication process for Er-doped glass ridge waveguides. The process does not require etching of an Er-doped film in defining the lateral dimension of a waveguide, but involves a lift-off process using polyimide as a sacrificial layer. An Er-doped soda-lime silicate glass film (1.5 micrometer thick) was deposited at 350 degrees Celsius using a collimated sputtering technique. Conventional sputtering techniques have been known to be incompatible with a lift-off process. The collimated sputtering, however, allowed us easy lift-off of Er-doped films, and produced well-defined ridges with smooth surface profiles as confirmed by scanning electron microscope analysis. Guided mode profiles were measured at 1.3 micrometer wavelength and compared with the simulation results.

Original language	English
Pages (from-to)	450-458
Number of pages	9
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	3006
DOIs	https://doi.org/10.1117/12.264241
State	Published - 1997
Externally published	Yes
Event	Optoelectronic Integrated Circuits - San Jose, CA, United States Duration: Feb 12 1997 → Feb 12 1997

ASJC Scopus Subject Areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Keywords

Collimated sputter deposition
Er-doped glass waveguides
Lift-off process

Access to Document

10.1117/12.264241

Cite this

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title = "Erbium-doped glass ridge waveguides fabricated with a collimated magnetron sputter deposition process",

abstract = "We report a new fabrication process for Er-doped glass ridge waveguides. The process does not require etching of an Er-doped film in defining the lateral dimension of a waveguide, but involves a lift-off process using polyimide as a sacrificial layer. An Er-doped soda-lime silicate glass film (1.5 micrometer thick) was deposited at 350 degrees Celsius using a collimated sputtering technique. Conventional sputtering techniques have been known to be incompatible with a lift-off process. The collimated sputtering, however, allowed us easy lift-off of Er-doped films, and produced well-defined ridges with smooth surface profiles as confirmed by scanning electron microscope analysis. Guided mode profiles were measured at 1.3 micrometer wavelength and compared with the simulation results. ",

keywords = "Collimated sputter deposition, Er-doped glass waveguides, Lift-off process",

author = "Li, \{Cheng Chung\} and Kim, \{Hong Koo\} and Michele Migliuolo",

year = "1997",

doi = "10.1117/12.264241",

language = "English",

volume = "3006",

pages = "450--458",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Optoelectronic Integrated Circuits ; Conference date: 12-02-1997 Through 12-02-1997",

}

TY - JOUR

T1 - Erbium-doped glass ridge waveguides fabricated with a collimated magnetron sputter deposition process

AU - Li, Cheng Chung

AU - Kim, Hong Koo

AU - Migliuolo, Michele

PY - 1997

Y1 - 1997

N2 - We report a new fabrication process for Er-doped glass ridge waveguides. The process does not require etching of an Er-doped film in defining the lateral dimension of a waveguide, but involves a lift-off process using polyimide as a sacrificial layer. An Er-doped soda-lime silicate glass film (1.5 micrometer thick) was deposited at 350 degrees Celsius using a collimated sputtering technique. Conventional sputtering techniques have been known to be incompatible with a lift-off process. The collimated sputtering, however, allowed us easy lift-off of Er-doped films, and produced well-defined ridges with smooth surface profiles as confirmed by scanning electron microscope analysis. Guided mode profiles were measured at 1.3 micrometer wavelength and compared with the simulation results.

AB - We report a new fabrication process for Er-doped glass ridge waveguides. The process does not require etching of an Er-doped film in defining the lateral dimension of a waveguide, but involves a lift-off process using polyimide as a sacrificial layer. An Er-doped soda-lime silicate glass film (1.5 micrometer thick) was deposited at 350 degrees Celsius using a collimated sputtering technique. Conventional sputtering techniques have been known to be incompatible with a lift-off process. The collimated sputtering, however, allowed us easy lift-off of Er-doped films, and produced well-defined ridges with smooth surface profiles as confirmed by scanning electron microscope analysis. Guided mode profiles were measured at 1.3 micrometer wavelength and compared with the simulation results.

KW - Collimated sputter deposition

KW - Er-doped glass waveguides

KW - Lift-off process

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UR - https://www.scopus.com/pages/publications/58749113631#tab=citedBy

U2 - 10.1117/12.264241

DO - 10.1117/12.264241

M3 - Conference article

AN - SCOPUS:58749113631

SN - 0277-786X

VL - 3006

SP - 450

EP - 458

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Optoelectronic Integrated Circuits

Y2 - 12 February 1997 through 12 February 1997

ER -

Erbium-doped glass ridge waveguides fabricated with a collimated magnetron sputter deposition process

Abstract

ASJC Scopus Subject Areas

Keywords

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